In this monograph, the authors offer a comprehensive examination of the
latest research on Laser Chemical Vapor Deposition (LCVD). Chapters
explore the physics of LCVD as well as the principles of a wide range of
related phenomena-including laser-matter interactions, heat transfer,
fluid flow, chemical kinetics, and adsorption. With this reference,
researchers will discover how to apply these principles to developing
theories about various types of LCVD processes; gain greater insight
into the basic mechanisms of LCVD; and obtain the ability to design and
control an LCVD system.