Daniel Adams

(Author)

Silver Metallization: Stability and Reliability (2008)Hardcover - 2008, 19 October 2007

Silver Metallization: Stability and Reliability (2008)
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Part of Series
Engineering Materials and Processes
Print Length
123 pages
Language
English
Publisher
Springer
Date Published
19 Oct 2007
ISBN-10
184800026X
ISBN-13
9781848000261

Description

With the lowest resistivity of all metals, silver is an attractive interconnect material for higher current densities and faster switching speeds in integrated circuits. Over the past ten years, extensive research has been conducted to address the thermal and electrical stability issues and the processing issues that have prevented silver from being used as an interconnect metal. Here is the first book to discuss the current understanding of silver metallization and its potential as a future interconnect material for integrated circuit technology. The authors provide details on a wide range of experimental, characterization, and analysis techniques. In addition, they discuss novel approaches used to overcome the thermal and electrical stability issues associated with silver metallization. The book is written for students, scientists, engineers, and technologists in the fields of integrated circuits and microelectronics research and development.

Product Details

Authors:
Daniel AdamsTerry L AlfordJames W Mayer
Book Edition:
2008
Book Format:
Hardcover
Country of Origin:
DE
Date Published:
19 October 2007
Dimensions:
23.88 x 15.75 x 1.27 cm
ISBN-10:
184800026X
ISBN-13:
9781848000261
Language:
English
Location:
London
Pages:
123
Publisher:
Weight:
317.51 gm

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