Glancing angle deposition (GLAD) is a physical vapor deposition method
in which by exploiting the atomic shadowing at very high vapor incidence
angle, a direct and spontaneous growth of columnar thin films (CTF) of a
wide range of materials can be attained. The easiness, low cost, and
versatility are the main features which make GLAD a promising nanoscale
fabrication technique. A controlled shape and in-plane distribution of
nanocolumns make the CTFs to play a vital role in number of
applications. Particularly, due to enhanced plasmonic activity and
interesting optical properties silver CTFs have found applications in
various fields such as, SERS substrates for biosensing, dichroic
filters, and plasmonic metamaterials. The central objective of this book
is to study the effect of deposition parameters on the growth of silver
CTFs and understand the growth mechanism during GLAD. The role of vapor
incidence angle, deposition rate, and reduced substrate temperature were
investigated and has been discussed in detail. The Effect of morphology
of silver CTFs on surface wetting and the physical properties like
evaporation and freezing of a sessile water droplet have been
investigated.