Silicon Devices and Process Integration covers state-of-the-art
silicon devices, their characteristics, and their interactions with
process parameters. It serves as a comprehensive guide which addresses
both the theoretical and practical aspects of modern silicon devices and
the relationship between their electrical properties and processing
conditions. The book is compiled from the author's industrial and
academic lecture notes and reflects years of experience in the
development of silicon devices.
Features include:
- A review of silicon properties which provides a foundation for
understanding the device properties discussion, including
mobility-enhancement by straining silicon;
- State-of-the-art technologies on high-K gate dielectrics, low-K
dielectrics, Cu interconnects, and SiGe BiCMOS;
- CMOS-only applications, such as subthreshold current and parasitic
latch-up;
- Advanced Enabling processes and process integration.
This book is written for engineers and scientists in semiconductor
research, development and manufacturing. The problems at the end of each
chapter and the numerous charts, figures and tables also make it
appropriate for use as a text in graduate and advanced undergraduate
courses in electrical engineering and materials science.