Scanning Probe Lithography (SPL) describes recent advances in the
field of scanning probe lithography, a high resolution patterning
technique that uses a sharp tip in close proximity to a sample to
pattern nanometer-scale features on the sample. SPL is capable of
patterning sub-30nm features with nanometer-scale alignment
registration. It is a relatively simple, inexpensive, reliable method
for patterning nanometer-scale features on various substrates. It has
potential applications for nanometer-scale research, for maskless
semiconductor lithography, and for photomask patterning.
The authors of this book have been key players in this exciting new
field. Calvin Quate has been involved since the beginning in the early
1980s and leads the research time that is regarded as the foremost group
in this field. Hyongsok Tom Soh and Kathryn Wilder Guarini have been the
members of this group who, in the last few years, have brought about
remarkable series of advances in SPM lithography. Some of these advances
have been in the control of the tip which has allowed the scanning speed
to be increased from mum/second to mm/second. Both non-contact and
in-contact writing have been demonstrated as has controlled writing of
sub-100 nm lines over large steps on the substrate surface. The
engineering of a custom-designed MOSFET built into each microcantilever
for individual current control is another notable achievement.
Micromachined arrays of probes each with individual control have been
demonstrated. One of the most intriguing new aspects is the use of
directly-grown carbon nanotubes as robust, high-resolution emitters.
In this book the authors concisely and authoritatively describe the
historical context, the relevant inventions, and the prospects for
eventual manufacturing use of this exciting new technology.
