An Advanced Study Institute on process and device modeling for
integrated circuit design was held in Louvain-la-Neuve. Belgium on July
19-29. 1977 under the auspices of the Scientific Affairs Division of
NATO. The Institute was organized by a scientific organizing committee
consisting of Professor F. Van de Wiele of the Universite Catholique de
Louvain. Professor W. L. Engl of the Technische Hochschule Aachen and
Professor P. Jespers of the Universite Catholique de Louvain. This book
represents the contributions of the lecturers at the Institute and the
chapters present a concise treatment of a very timely subject. namely.
process and device modeling for integrated circuit design. The
organization of the book parallels the program at the Institute with an
introd0ction -comprised of a review of mo- deling and basic
semiconductor physics. This is followed by the chapters devoted to basic
technologies. modeling of bipolar and MoS devices. The last chapter of
the book presents the specific topic of process modeling. The subject
matter of this book is suitable for a wide range of interests from the
advanced student. through the practisihg physicist and engineer. to the
research worker. Although a novice may find some difficulty with the
mathematical development. he can acquire a perspective into the field of
process and device modeling for integrated circuit design with this
bDOk. Likewise. portions of this book may be used as a textbook since
the chap- ters are intructional and self-contained.