FIB Nanostructures reviews a range of methods, including milling,
etching, deposition, and implantation, applied to manipulate structures
at the nanoscale. Focused Ion Beam (FIB) is an important tool for
manipulating the structure of materials at the nanoscale, and
substantially extends the range of possible applications of
nanofabrication. FIB techniques are widely used in the semiconductor
industry and in materials research for deposition and ablation,
including the fabrication of nanostructures such as nanowires,
nanotubes, nanoneedles, graphene sheets, quantum dots, etc. The main
objective of this book is to create a platform for knowledge sharing and
dissemination of the latest advances in novel areas of FIB for
nanostructures and related materials and devices, and to provide a
comprehensive introduction to the field and directions for further
research. Chapters written by leading scientists throughout the world
create a fundamental bridge between focused ion beam and nanotechnology
that is intended to stimulate readers' interest in developing new types
of nanostructures for application to semiconductor technology. These
applications are increasingly important for the future development of
materials science, energy technology, and electronic devices. The book
can be recommended for physics, electrical engineering, and materials
science departments as a reference on materials science and device
design.
