Charles Chiang

(Author)

Design for Manufacturability and Yield for Nano-Scale CMOSPaperback, 22 November 2010

Design for Manufacturability and Yield for Nano-Scale CMOS
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Part of Series
Integrated Circuits and Systems
Print Length
255 pages
Language
English
Publisher
Springer
Date Published
22 Nov 2010
ISBN-10
9048173035
ISBN-13
9789048173037

Description

Manufacturability and yield are no longer a fabrication, packaging, and test concerns. They are aspects that have to be designed in, and they are everybody's responsibility. Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, and through statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design's manufacturability and yield. A must read book for the serious designer.

Product Details

Authors:
Charles ChiangJamil Kawa
Book Format:
Paperback
Country of Origin:
NL
Date Published:
22 November 2010
Dimensions:
23.39 x 15.6 x 1.52 cm
ISBN-10:
9048173035
ISBN-13:
9789048173037
Language:
English
Location:
Dordrecht
Pages:
255
Publisher:
Weight:
408.23 gm

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