Compound and Josephson High-Speed Devices (Softcover Reprint of the Original 1st 1993)Paperback - Softcover Reprint of the Original 1st 1993, 4 June 2013

Compound and Josephson High-Speed Devices (Softcover Reprint of the Original 1st 1993)
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Part of Series
Microdevices
Print Length
306 pages
Language
English
Publisher
Springer
Date Published
4 Jun 2013
ISBN-10
1475797761
ISBN-13
9781475797763

Description

In recent years, III-V devices, integrated circuits, and superconducting integrated circuits have emerged as leading contenders for high-frequency and ultrahigh- speed applications. GaAs MESFETs have been applied in microwave systems as low-noise and high-power amplifiers since the early 1970s, replacing silicon devices. The heterojunction high-electron-mobility transistor (HEMT), invented in 1980, has become a key component for satellite broadcasting receiver systems, serving as the ultra-low-noise device at 12 GHz. Furthermore, the heterojunction bipolar transistor (HBT) has been considered as having the highest switching speed and cutoff frequency in the semiconductor device field. Initially most of these devices were used for analog high-frequency applications, but there is also a strong need to develop high-speed III-V digital devices for computer, telecom- munication, and instrumentation systems, to replace silicon high-speed devices, because of the switching-speed and power-dissipation limitations of silicon. The potential high speed and low power dissipation of digital integrated circuits using GaAs MESFET, HEMT, HBT, and superconducting Josephson junction devices has evoked tremendous competition in the race to develop such technology. A technology review shows that Japanese research institutes and companies have taken the lead in the development of these devices, and some integrated circuits have already been applied to supercomputers in Japan. The activities of Japanese research institutes and companies in the III-V and superconducting device fields have been superior for three reasons. First, bulk crystal growth, epitaxial growth, process, and design technology were developed at the same time.

Product Details

Book Edition:
Softcover Reprint of the Original 1st 1993
Book Format:
Paperback
Country of Origin:
NL
Date Published:
4 June 2013
Dimensions:
25.4 x 17.78 x 1.7 cm
ISBN-10:
1475797761
ISBN-13:
9781475797763
Language:
English
Location:
New York, NY
Pages:
306
Publisher:
Springer
Weight:
557.92 gm

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