The authoritative reference on catalytic chemical vapor deposition,
written by the inventor of the technology.
This comprehensive book covers a wide scope of Cat-CVD and related
technologies from the fundamentals to the many applications, including
the design of a Cat-CVD apparatus. Featuring contributions from four
senior leaders in the field, including the father of catalytic chemical
vapor deposition, it also introduces some of the techniques used in the
observation of Cat-CVD related phenomena so that readers can understand
the concepts of such techniques.
Catalytic Chemical Vapor Deposition: Technology and Applications of
Cat-CVD begins by reviewing the analytical tools for elucidating the
chemical reactions in Cat-CVD, such as laser-induced fluorescence and
deep ultra-violet absorption, and explains in detail the underlying
physics and chemistry of the Cat-CVD technology. Subsequently it
provides an overview of the synthesis and properties of Cat-CVD-prepared
inorganic and organic thin films. The last parts of this unique book are
devoted to the design and operation of Cat-CVD apparatuses and the
applications.
- Provides coherent coverage of the fundamentals and applications of
catalytic chemical vapor deposition (Cat-CVD)
- Assembles in one place the state of the art of this rapidly growing
field, allowing new researchers to get an overview that is difficult
to obtain solely from journal articles
- Presents comparisons of different Cat-CVD methods which are usually
not found in research papers
- Bridges academic and industrial research, showing how CVD can be
scaled up from the lab to large-scale industrial utilization in the
high-tech industry.
Catalytic Chemical Vapor Deposition: Technology and Applications is an
excellent one-stop resource for researchers and engineers working on or
entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related
technologies.
